Point-of-use photochemical filter with superior contaminant retention and low hold-up volume performance in sub-10 - 180 nm technology nodes.
- Cost-effective, scalable and convenient alternative for testing and particle evaluation of process chemicals
- Optimized filter improves filtration of photoresists and other process chemicals without releasing retained particles back into the process
- No prewetting required for UPE membrane reduces the potential sources of microbubble formation and avoids problems associated with incomplete wetting and the mixing of incompatible chemicals
在亚10 - 180纳米技术节点中，使用点光化学过滤器具有卓越的污染物截留和低滞留体积性能。用于工艺化学品测试和颗粒评估的经济、可扩展且方便的替代方案优化的过滤器改善了光刻胶和其他工艺化学品的过滤，而不会将残留颗粒释放回工艺中UPE膜不需要预润湿减少了微气泡形成的潜在来源，并避免了与不完全润湿和不相容化学品混合相关的问题
